dielectric
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- HfO2 thin films are proposed as high-k gate dielectric, especially for the fabrication of ultra-large-scale integration systems.
- Dielectrophoresis (DEP) is a spatially inhomogeneous force field phenomenon that arises when dielectrically-polarizable particles are subjected to a spatially inhomogeneous, alternating electric field.
- Antiferroelectrics (AFEs) have a great potential for modern electronic devices by virtue of the large strain during the antiferroelectric-to-ferroelectric (AFE-FE) phase transition under external electric fields.
- High dielectric constant (K) gate dielectrics have been intensively developed to overcome problems of transient charge trapping, threshold voltage shifts and Fermi level pinning of the gate electrode.