photopolymers crucial
Research Topic
Language: English
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Research problems linked to this topic
- Self-assembly of block copolymers (BCPs) into arrays of well-defined nanoscopic structures has attracted extensive academic and industrial interests over the past several decades.
- Self-developing photopolymers are crucial materials for making high efficiency volume holograms.
- Photopolymerizable materials are the focus of extensive research across a variety of fields ranging from additive manufacturing to regenerative medicine.
- There is a critical need to develop a method to pattern semiconducting polymers for device applications on the sub-micrometer scale.
- Roll-to-roll ultraviolet nanoimprint lithography (RTR UV-NIL) has attracted much attention as a high-throughput nanofabrication process.
- In practical applications, the properties of materials are highly dependent on the complexity of structures that render the necessity for the fabrication of complex polymer brush microstructures. They have been fabricated via several patterning strategies combining with SIP, e.g. electron-beam chemical lithography (EBCL) or electron-beam induced carbon deposition (EBCD). These elegant patterning strategies remain inaccessible to a large number of researchers due to the instrumental expensive complexity required.